고대홍 교수 연구실
Yonsei University · Materials Science and Engineering
About
고대홍 교수 연구실은 연세대 신소재공학부 소속으로, 반도체 박막 공정과 재료를 연구한다. 원자층증착(ALD)을 활용한 고유전율(high-k) 게이트 절연막, 상변화 메모리(PRAM)용 칼코지나이드/산화물 적층 구조 등 차세대 반도체 소자용 박막 기술을 다룬다.
Recent papers
- Selective wet etching of carbon-doped SiGe sacrificial layers in strain-compensated SiGe(:C)/Si heterostructures for vertically stacked semiconductor devicesNewChemical Engineering Journal · Oct 20
- Surface reaction mechanisms of SiH4 and Si2H6 for epitaxial silicon growth on Si(100): Effects of hydrogen coverageNewMaterials Science in Semiconductor Processing · Oct 16
- Selective chemical wet etching of B-doped Si0.8Ge0.2 epitaxial layers for multistacked memory devicesMaterials Science in Semiconductor Processing · Aug 30
From OpenAlex · papers whose author affiliation matches this university
Labs doing related research
Labs that recently published on topics this lab's recent papers share
Shared topic: Semiconductor materials and devices
Jin-Seong Park
Hanyang University · Materials Science and Engineering
High-Pressure Deuterium Annealing Enables Robust Trap Passivation in ALD HfO2/Si MOS Capacitors under High-Temperature Bias StressACS Applied Electronic Materials · Oct 3Hwang, Cheol Seong
Seoul National University · Materials Science and Engineering
Three-dimensional dynamic random-access memory beyond two-dimensional scaling limitsNewNature Reviews Electrical Engineering · Oct 23유우종 교수 연구실
Sungkyunkwan University (SKKU) · Electronic and Electrical Engineering
Integration of a Two-Terminal Memristor Array with a Vertical Floating-Gate Structure for Antagonistic Center–Surround Receptive Field Neural NetworksACS Nano · Sep 25
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- 김자영 교수 연구실
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